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dc.contributor.authorZhou, Haoruo
dc.date.accessioned2019-08-08
dc.date.available2019-08-08
dc.date.issued2019-02-28
dc.identifier.urihttp://hdl.handle.net/2123/20862
dc.description.abstractIn the present work, nanocrystalline Ti/Cu multilayer thin films were fabricated using direct current magnetron sputtering with different layer thicknesses, namely 250, 100, 50, 25 and 5 nm. In addition, a group of thin films were prepared with various multiple modulation ratios where each bilayer was set to be equally 100 nm. The size-dependent deformation behaviour of the films was studied using the nano-indentation and nano-scratching techniques. The results showed that the flow strength of the films tended to increase as the layer thickness decreased. Moreover, the strength and scratch resistance of the films can be further optimized by tailoring the thicknesses of the two adjacent layers, while the thickness of each bilayer remains unchanged. The size-dependent strengthening mechanism is discussed with respect to microscopic observations.en_AU
dc.rightsThe author retains copyright of this thesis. It may only be used for the purposes of research and study. It must not be used for any other purposes and may not be transmitted or shared with others without prior permission.en_AU
dc.subjectMetallic Multilayersen_AU
dc.subjectNanoindentationen_AU
dc.subjectNanostratchingen_AU
dc.subjectDeformation Mechanismen_AU
dc.titleDesign and Size-dependent Plastic Behaviour, Deformation Mechanism and Scratching Resistance of Nanocrystalline Ti-based Multilayered Thin Films Fabricated by Direct Current Magnetron Sputteringen_AU
dc.typeThesisen_AU
dc.type.thesisMasters by Researchen_AU
usyd.facultyFaculty of Engineering, School of Aerospace, Mechanical and Mechatronic Engineeringen_AU
usyd.degreeMaster of Philosophy M.Philen_AU
usyd.awardinginstThe University of Sydneyen_AU


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